Materials and Processes for Next Generation Lithography (Hardcover)

1. Overview of materials and processes for lithography 2. Molecular excitation and relaxation of extreme ultraviolet lithography photoresists 3. Theory: Electron-induced chemistry 4. EUV lithography process challenges 5. EUV lithography patterning challenges 6. The chemistry and application of nonchemically amplified (non-CA) chain-scission resists 7. Chemically amplified resists and acid amplifiers 8. Negative-tone organic molecular resists 9. Positive molecular resists 10. Mainstreaming inorganic metal-oxide resists for high-resolution lithography 11. Molecular organometallic resists for EUV (MORE) 12. SML electron beam resist: Ultra-high aspect ratio nanolithography 13. Alternative resist approaches 14. Next generation lithography-the rise of unconventional methods? 15. Tip-based nanolithography methods and materials 16. Thermal scanning probe lithography 17. Scanning helium ion beam lithography