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· 분류 : 외국도서 > 기술공학 > 기술공학 > 나노테크놀리지/MEMS
· ISBN : 9780521158596
· 쪽수 : 408쪽
· 출판일 : 2011-04-14
목차
List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito; Index.














