Sub-Half-Micron Lithography for Ulsis (Hardcover)

1. Introduction Masao Fukuma; 2. Optical lithography Kunihiko Kasama, Shinji Okazaki, Hisatake Sano and Wataru Wakamiya; 3. X-ray lithography Kimiyoshi Deguchi, Teruo Hosokawa, Sunao Ishihara and Katsumi Suzuki; 4. Electron beam lithography Takayuki Abe, Koichi Moriizumi, Yukinori Ochiai, Norio Saitou, Tadahiro Takigawa and Akio Yamada; 5. Ion beam lithography Masanori Komuro and Shinj Matsui; 6. Resists Hiroshi Ban, Tadayoshi Kokubo, Makoto Nakase and Takeshi Ohfuji; 7. Metrology, defect inspection and repair Tadahito Matsuda, Toru Tojo and Seiichi Yabumoto; Index.