Developments in Surface Contamination and Cleaning: Fundamentals and Applied Aspects (Hardcover)

Introduction
Part 1: Fundamentals
The Physical Nature of Very, Very Small Particles and its Impact on their Behavior
Elucidating the Nature of Very Small Particles
Transport and Deposition of Aerosol Particles
Relevance of Particle Transport in Surface Deposition and Cleaning
Tribological Implications of Particles
Airborne Molecular Contamination
Engineering Aspects of Particle Adhesion and Removal
ESD Controls in Cleanroom Environments: Relevance to Particle Deposition
Part 2: Characterization of Surface Contaminants
Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
Surface Analysis Methods for Contaminant Identification
Ionic Contamination and Analytical Techniques for Ionic Contamination
Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants
Wettability Techniques to Monitor the Cleanliness of Surfaces
Part 3: Methods for Removal of Surface Contamination
The Use of Surfactants to Enhance Particle Removal from Surfaces
Cleaning with Solvents
Removal of Particles by Chemical Cleaning
Cleaning Using High-Speed Impinging Jet
Microabrasive Precision Cleaning and Processing Technology
Precision Cleaning Using Microdroplet Beams
Cleaning Using Argon/Nitrogen Cryogenic Aerosols
Carbon Dioxide Snow Cleaning
Coatings for Preventing or Deactivation of Biological Contaminants
Detailed Study of Semiconductor Wafer Drying