Handbook of Physical Vapor Deposition (PVD) Processing (Hardcover, 2)

Introduction; Substrate ("Real") Surfaces and Surface Modification; The "Good" Vacuum (Low Pressure) Processing Environment; The Sub-Atmospheric Processing Environments; The Low-Pressure Plasma Processing Environment; Vacuum Evaporation and Vacuum Deposition; Physical Sputtering and Sputter Deposition (Sputtering); Arc Vapor Deposition; Ion Plating and Ion Beam Assisted Deposition; Atomistic Film Growth and Some Growth-Related Film Properties; Film Characterization and Some Basic Film Properties; Adhesion and Deadhesion; Cleaning; External Processing Environment; Transfer of Technology from R&D to Manufacturing