Handbook of Photomask Manufacturing Technology (Hardcover)

Foreword by Yoshio NishiPreface, Syed RizviINTRODUCTIONIntroduction to Mask MakingA.G. ZanzalMASK WRITINGData PreparationP.J.M. van Adrichem and C.K. KalusMask Writers: An OverviewS. BabinE-Beam Mask WritersN. SaitouLaser Mask WritersC. RydbergOPTICAL MASKSOptical masks: An OverviewN. YoshiokaConventional Optical MasksS.A. RizviAdvanced Optical MasksW. Maurer and F. SchellenbergNGL MASKSNGL Masks: An OverviewK.R. Kimmel and M. LercelMasks for Electron Beam Projection LithographyH. Sano, S. Palmer, and M. YamabeMasks for Extreme Ultraviolet LithographyP-Y. YanMasks for Ion Projection LithographyS.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. LoeschnerMask for Proximity X-Ray LithographyM. Oda and H. YoshiharaMASK PROCESSING, MATERIALS, AND PELLICLESMask SubstrateS.A. RizviResists for Mask MakingB. Rathsack, D. Medeiros, and C.G. WilsonResist Charging and HeatingM. Bai, D. Chu, and F. PeaseMask ProcessingS.A. RizviMask Materials: Optical PropertiesV. LibermanPelliclesT. Yen, C.B. Wang, and R. HeuserMASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRSPhotomask Feature MetrologyJ. PotzickOptical Critical Dimension MetrologyR.J. HooblerPhotomask Critical Dimension Metrology in the Scanning Electron MicroscopeM.T. PostekGeometrical Characterization of Mask Using SPMS. Muckenhirn and A. MeyyappanMetrology of Image PlacementM.T. TakacOptical Thin Film Metrology for Photomask ApplicationsE. ApakPhase Measurement Tool for PSMH. KusunoseMask Inspection: Theories and PrincipleA. Rosenbusch and S. HemarTool for Inspecting Masks: Lasertec MD 2500M. Yonezawa and T. MatsuyamaTool for Mask Image EvaluationA. ZiboldMask RepairsR. LeeMODELING AND SIMULATIONModeling and SimulationA. ErdmannINDEX