Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing (Hardcover)

Surface Chemical Electronics at the Semiconductor Surface; Tadahiro OhmiPrinciples of Semiconductor Device Wet Cleaning; Hitoshi MorinagaHigh-Performance Wet-Cleaning Technology; Hiroshi Morita, Akinobu Teramoto, Senri Ojima, and Kerichi MitshumoriEtching of Various SiO2; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, Jun Takano, and Akinobu TaramotoSilicon Etching; Kenichi Mitsumori and Nobuhiko InoueChemical Composition Control Technology; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, and Jun TakanoWet Vapor Resist Stripping Technology; Senri Ojima and Tadahiro OhmiAntistatic Technology; Kenichi Mitsumori and Takashi ImaokaChemical Waste Reclamation Technology; Hiroshi Sugawara and Takashi ImaokaUltrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility; Ikunori Yokoi, Masaaki Nagase, Koji Nishino, Nobukazu Ikeda, Masafumi Kitano, Hiroto Izumi, and Tadahiro Ohmi