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· 분류 : 외국도서 > 기술공학 > 기술공학 > 전자공학 > 트랜지스터
· ISBN : 9781441915467
· 쪽수 : 445쪽
· 출판일 : 2010-03-22
목차
Non-Silicon MOSFET Technology: A Long Time Coming.- Properties and Trade-Offs of Compound Semiconductor MOSFETs.- Device Physics and Performance Potential of III-V Field-Effect Transistors.- Theory of HfO2-Based High-k Dielectric Gate Stacks.- Density Functional Theory Simulations of High-k Oxides on III-V Semiconductors.- Interfacial Chemistry of Oxides on III-V Compound Semiconductors.- Atomic-Layer Deposited High-k/III-V Metal-Oxide-Semiconductor Devices and Correlated Empirical Model.- Materials and Technologies for III-V MOSFETs.- InGaAs, Ge, and GaN Metal-Oxide-Semiconductor Devices with High-k Dielectrics for Science and Technology Beyond Si CMOS.- Sub-100 nm Gate III-V MOSFET for Digital Applications.- Electrical and Material Characteristics of Hafnium Oxide with Silicon Interface Passivation on III-V Substrate for Future Scaled CMOS Technology.- p-type Channel Field-Effect Transistors.- Insulated Gate Nitride-Based Field Effect Transistors.- Technology/Circuit Co-Design for III-V FETs.















