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· 제목 : Hf-Based High-K Dielectrics (Paperback) (Process Development, Performance Characterization, And Reliability)
· 분류 : 외국도서 > 기술공학 > 기술공학 > 전기공학
· ISBN : 9781598290042
· 쪽수 : 104쪽
· 출판일 : 2005-10-03
· 분류 : 외국도서 > 기술공학 > 기술공학 > 전기공학
· ISBN : 9781598290042
· 쪽수 : 104쪽
· 출판일 : 2005-10-03
목차
- Introduction
- Hard- and Soft-Breakdown Characteristics of Ultrathin HfO2 Under Dynamic and Constant Voltage Stress
- Impact of High Temperature Forming Gas and D2 Anneal on Reliability of HfO2 Gate Dielectrics
- Effect of Barrier Height and the Nature of Bilayer Structure of HfO2 with Dual Metal Gate Technology
- Bimodal Defect Generation Rate by Low Barrier Height and its Impact on Reliability Characteristics
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