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· 분류 : 외국도서 > 기술공학 > 기술공학 > 전자공학 > 회로
· ISBN : 9789811512148
· 쪽수 : 425쪽
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Table of contents
Ⅰ Introduction
1 Features, Principles and Developments of Ferroelectric-gate Field Effect Transistors
- Prof. M. Okuyama
Ⅱ Practical Characteristics of Inorganic Ferroelectric-gate FETs : Si-Based Ferroelectric-gate Field Effect Transistors
2 Development of High-Endurance and Long-Retention FeFETs
of Pt/CaySr1?yBi2Ta2O9/(HfO2)x(Al2O3)1?x/Si Gate Stacks
- Mitsue Takahashi and Shigeki Sakai
3 Downsizing of high-endurance and long-retention Pt/CaySr1?yBi2Ta2O9/(HfO2)x(Al2O3)1?x/Si FeFETs
- Mitsue Takahashi and Shigeki Sakai
4 Nonvolatile field-effect transistors using ferroelectric doped HfO2 films
- Uwe Schroeder, Stefan Slesazeck, Halid Mulaosmanovic and Thomas Mikolajick
5 Switching in nanoscale hafnium oxide based ferroelectric transistor
- Halid Mulaosmanovic, Uwe Schroeder, Thomas Mikolajick and Stefan Slesazeck
III Practical Characteristics of Inorganic Ferroelectric-Gate FETs: Thin Film-Based Ferroelectric-Gate Field Effect Transistors
6 Oxide-channel ferroelectric-gate thin film transistors with nonvolatile memory function
- Eisuke Tokumitsu
7 ZnO/Pb(Zr,Ti)O3 gate structure Ferroelectric FETs
- Yukihiro Kaneko
8 Novel ferroelectric gate field-effect transistors (FeFETs); controlled polarization-type FeFETs
- Norifumi Fujimura and Takeshi Yoshimura
Ⅳ Practical Characteristics of Organic Ferroelectric-Gate FETs: Si-Based Ferroelectric-Gate Field Effect Transistors
9 Non-volatile Ferroelectric Memory Transistors Using PVDF, P(VDF-TrFE) and Blended PVDF/P(VDF-TrFE) Thin films
- Dae-Hee Han and Byung-Eun Park
10 Poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE))/Si structure Ferrorlrctric-gate FETs
- Yoshihisa Fujisaki
V Practical Characteristics of Organic Ferroelectric-Gate FETs: Thin Film-Based Ferroelectric-Gate Field Effect Transistors
11 P(VDF-TrFE) and P(VDF-TeFE)/organic semiconductor structure ferroelectric-gate FET memories
-Takeshi Kanashima and Masanori Okuyama
12 Nonvolatile Ferroelectric Memory Thin-Film Transistors Using a Poly(vinylidene fluoride trifluoroethylene) Gate Insulator and an Oxide Semiconductor Active Channel
-Sung-Min Yoon
VI Practical Characteristics of Organic Ferroelectric-Gate FETs : Ferroelectric-Gate Field Effect Transistors with Flexible Substrates
13 Mechanically Flexible Non-volatile Field Effect Transistor Memories with
Ferroelectric Polymers
-Richard H. Kim and Cheolmin Park
14 Paper Transistors with Organic Ferroelectric P(VDF-TrFE) Thin Films Using a Solution Processing Method
- Dae-Hee Han and Byung-Eun Park
15 Non-volatile Organic Ferroelectric field-effect transistors fabricated on Flexible Substrates
- Dae-Hee Han and Byung-Eun Park
Ⅶ Applications and Future Prospects
16 Novel applications to NAND flash memory circuits
-Shigeki Sakai and Mitsue Takahashi
17 Novel Applications of Antiferroelectrics and Relaxor Ferroelectrics: a Material’s Point of View
- Park Min Hyuk Park and Cheol Seong Hwang
18 Polymorphism of hafnia-based ferroelectrics for ferroelectric field-effect transistors
- Min Hyuk Park
19 Adaptive-Learning Synaptic Devices Using Ferroelectric-Gate Field-Effect Transistors for Neuromorphic Applications
-Sung-Min Yoon and Hiroshi Ishiwara
20 FeFETs for neuromorphic systems
- Halid Mulaosmanovic, Thomas Mikolajick and Stefan Slesazeck
21 Applications of Oxide Channel Ferroelectric-Gate Thin Film Transistors
-Eisuke Tokumitsu and Tatsuya Shimoda