Noncontact Atomic Force Microscopy (Hardcover, 2002)

1 Introduction.- 1.1 AFM in Retrospective.- 1.2 Present Status of NC-AFM.- 1.3 Future Prospects for NC-AFM.- References.- 2 Principle of NC-AFM.- 2.1 Basics.- 2.1.1 Relation to the Scanning Tunneling Microscope (STM).- 2.1.2 Atomic Force Microscope (AFM).- 2.1.3 Operating Modes of AFMs.- 2.1.4 Scanning Speed, Signal Bandwidth and Noise.- 2.2 The Four Additional Challenges Faced by AFM.- 2.2.1 Jump-to-Contact and Other Instabilities.- 2.2.2 Contribution of Long-Range Forces.- 2.2.3 Noise in the Imaging Signal.- 2.2.4 Non-Monotonic Imaging Signal.- 2.3 Frequency-Modulation AFM (FM-AFM).- 2.3.1 Experimental Setup.- 2.3.2 Applications.- 2.4 Relation between Frequency Shift and Forces.- 2.4.1 Generic Calculation.- 2.4.2 Frequency Shift for a Typical Tip-Sample Force.- 2.4.3 Calculation of the Tunneling Current for Oscillating Tips.- 2.5 Noise in Frequency-Modulation AFM.- 2.5.1 Generic Calculation.- 2.5.2 Noise in the Frequency Measurement.- 2.5.3 Optimal Amplitude for Minimal Vertical Noise.- 2.6 A Novel Force Sensor Based on a Quartz Tuning Fork.- 2.6.1 Quartz Versus Silicon as a Cantilever Material.- 2.6.2 Benefits in Clamping One of the Beams (qPlus Configuration).- 2.7 Conclusion and Outlook.- References.- 3 Semiconductor Surfaces.- 3.1 Instrumentation.- 3.2 Three-Dimensional Mapping of Atomic Force.- 3.3 Control of Atomic Force.- 3.4 Imaging Mechanisms for Si(100)2?l and Si(100)2?l:H.- 3.5 Surface Strain on an Atomic Scale.- 3.6 Low Temperature Image of Si(100) Clean Surface.- 3.7 Mechanical Control of Atom Position.- 3.8 Atom Identification Using Covalent Bonding Force.- 3.9 Charge Imaging with Atomic Resolution.- 3.10 Mechanical Atom Manipulation.- References.- 4 Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductor Surfaces.- 4.1 Experimental Conditions.- 4.2 Bias Dependence of NC-AFM Images for Si(lll)7?7.- 4.2.1 Mechanism of Inverted Atomic Corrugation.- 4.2.2 NC-AFM Imaging and Tunneling Current.- 4.3 NC-AFM Images for Ge/Si(lll).- 4.4 Concluding Remarks.- References.- 5 Alkali Halides.- 5.1 Introduction.- 5.1.1 Experimental Techniques.- 5.1.2 Relevant Forces.- 5.2 Imaging of Single Crystals.- 5.2.1 Sample Preparation.- 5.2.2 Atomic Corrugation.- 5.2.3 Imaging of Defects.- 5.2.4 Mixed Alkali Halide Crystals.- 5.3 Imaging of Thin Films.- 5.3.1 Preparation of Thin Films.- 5.3.2 Atomic Resolution at Low-Coordinated Sites.- 5.4 Radiation Damage.- 5.4.1 Metallization and Bubble Formation in CaF2.- 5.4.2 Monatomic Pits in KBr.- 5.5 Dissipation Measurements.- 5.5.1 Material and Site-Specific Contrast.- 5.5.2 Using Damping for Distance Control.- References.- 6 Atomic Resolution Imaging on Fluorides.- 6.1 Experimental Techniques.- 6.2 Tip Instabilities.- 6.3 Flat Surfaces.- 6.4 Step Edges.- References.- 7 Atomically Resolved Imaging of a NiO(001) Surface.- 7.1 Antiferromagnetic Nickel Oxide.- 7.2 Experimental Considerations.- 7.3 Morphology of the Cleaved Surface.- 7.4 Atomically Resolved Imaging Using Non-Coated and Fe-Coated Si Tips.- 7.5 Short-Range Magnetic Interaction.- 7.6 Analysis of the Cross-Section.- 7.7 Conclusion.- References.- 8 Atomic Structure, Order and Disorder on High Temperature Reconstructed ?-Al2O3(0001).- 8.1 The Clean Surface.- 8.2 Defect Formation upon Water Exposure.- 8.3 Self-Organized Formation of Nanoclusters.- References.- 9 NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides.- 9.1 Introduction.- 9.2 l?l to 1?3 Phase Transition of TiO2(100).- 9.3 Surface Reconstructions of TiO2(110).- 9.4 The 1?2 Reconstruction of SnO2(110).- 9.5 Imaging Thin Film Alumina: NiAl(110)-Al2O3.- 9.6 Growth of Cu and Pd on $$ \alpha - Al_2 O_3 \left( {0001} ight) - \sqrt {31} imes \sqrt {31} R \pm 9^\circ $$.- 9.7 A Short-Range-Ordered Overlayer of K on TiO2(110).- 9.8 Conclusions.- References.- 10 Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces.- 10.1 Background.- 10.2 Brief Description of Experiments.- 10.3 Surface Structures of TiO2(110).- 10.4 Adsorbed Atoms