소자재료 공정개론

Chapter 01 서 론
1.1 소재, 소자와 공정 ······································································· 2
1.2 재료의 종류 ·············································································· 14
1.3 반도체기술 로드맵 ···································································· 18
1.4 태양전지·· ················································································· 22
연습문제 ··················································································· 28

Chapter 02 규소소재, 결정성장, 웨이퍼 제조
2.1 규소소재 ··················································································· 30
2.2 결정의 성장 ·············································································· 37
2.3 초크랄스키 결정성장 공정 ························································ 43
2.4 결정성장 공정의 해석 ······························································· 48
2.5 웨이퍼의 제조 ··········································································· 59
연습문제 ··················································································· 70

Chapter 03 세정공정
3.1 오염 물질 ·················································································· 74
3.2 클린룸과 웨이퍼의 세정 ···························································· 77
3.3 게터링공정 ················································································ 81
연습문제 ··················································································· 84

Chapter 04 규소의 산화공정
4.1 산화막의 용도 및 물성 ····························································· 88
4.2 산화공정 ··················································································· 94
4.3 산화공정 시스템 ····································································· 112
연습문제 ················································································· 116
viii

Chapter 05 확산공정
5.1 고체용액 및 고체상에서의 확산 ·············································· 121
5.2 확산계수 ················································································· 125
5.3 확산방정식과 도판트 분포 ······················································ 130
5.4 확산공정 ················································································· 138
연습문제 ················································································· 144

Chapter 06 이온주입공정
6.1 공정의 기본 원리 ··································································· 148
6.2 레인지이론(range theory) ····················································· 152
6.3 이온 채널링, 결정의 손상 및 어닐링 ····································· 162
연습문제 ················································································· 173

Chapter 07 묘화(lithography) 공정
7.1 광리소그라피 ··········································································· 177
7.2 광원과 노광 시스템 ································································ 181
7.3 감광성 고분자(포토레지스트) ·················································· 190
7.4 리소그라피공정 ······································································· 197
연습문제 ················································································· 204

Chapter 08 플라즈마 공정
8.1 플라즈마의 특성 ····································································· 209
8.2 플라즈마 화학반응 ·································································· 216
8.3 플라즈마 반응 시스템 ····························································· 222
연습문제 ················································································· 225
ix

Chapter 09 화학증착공정(CVD: chemical vapor deposition)
9.1 CVD공정의 특징 및 역사 ······················································· 228
9.2 CVD공정의 분류 ····································································· 236
9.3 화학증착 전구체 ····································································· 241
9.4 공정의 기본 원리 ··································································· 256
9.5 화학증착공정의 응용 ······························································· 272
9.6 원자층 화학증착 ····································································· 287
연습문제 ················································································· 295
참고문헌 ················································································· 297

Chapter 10 물리증착공정(PVD: physical vapor deposition)
10.1 물리증착법의 특징 ································································ 300
10.2 증발법 ·················································································· 302
10.3 스퍼터링법 ············································································ 310
10.4 금속화공정 ············································································ 319
연습문제 ················································································· 324

Chapter 11 식각공정(etching)
11.1 식각 메카니즘 ······································································ 328
11.2 반응 시스템 ·········································································· 341
11.3 반도체소자에의 응용 ···························································· 348
11.4 화학 기계적 연마 ································································· 351
연습문제 ················································································· 363
참고문헌 ················································································· 365

부 록···································································· 367
부록 1 단위 및 상수들 ··································································368
부록 2 단위 변환표 ········································································371
부록 3 원자들의 특성 ····································································372
부록 4 실리콘의 물성(300°K) ·······················································375
부록 5 Complementary Error Function Table ··························376
찾아보기································································ 377