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· 분류 : 외국도서 > 과학/수학/생태 > 과학 > 물리학 > 일반
· ISBN : 9789814613729
· 쪽수 : 424쪽
목차
A Brief Introduction of the Crystal Structure
Introduction
Crystal Structure
Unit Cell: Primitive and Nonprimitive
Symmetry Operations
Types of Lattices
Index System for Crystal Planes and Directions
Cubic Structures
Stereographic Projection
References
Brief Overview of Silicon Wafer Manufacturing and Microfabrication Techniques
What Is Silicon?
Why Is Silicon Used as a Material for ICs and MEMS?
What Are Microelectromechanical Systems?
Wafer Manufacturing
Silicon Microfabrication Processes
References
Isotropic Etching of Silicon and Related Materials
Isotropic Etching Properties
Isotropic Etching Solutions
Conditions for Isotropic Etching
Applications
References
KOH-Based Anisotropic Etching
Etching in Pure KOH Solutions
Effect of Alcohols and Surfactant Additives
References
TMAH-Based Anisotropic Etching
Introduction
The Etching Mechanism
Etch Rates
Surface Morphology
Undercutting and Etched Profiles
Why Are Etching Characteristics Affected When a Surfactant Is Added to TMAH?
Etched Profile Control
Summary
References
Convex and Concave Corners in Silicon Wet Bulk Micromachining
Introduction
Etch Rate, Underetching, and Undercutting
Role of Corner Undercutting in MEMS Fabrication
Why Does Undercutting Start at Convex Corners?
Etched Profiles at Sidewalls and Corners
Fabrication Techniques of Convex Corners
Summary
References
Alignment of Mask Patterns to Crystallographic Directions
Introduction
Role of Precise Alignment in Wet Bulk Micromachining
Alignment Techniques
Summary
References
Simple to Complex Structures Using Wet Bulk Micromachining
Introduction
Cavities, Channels, and Mesa Structures
Microstructures with 45° Slanted Sidewalls
Silicon Gratings
Suspended Microstructures
Microstructures with Perfectly Sharp Edges and Corners
Suspended Microfluidic Channels
AFM Cantilevers
Microvalves and Micropumps
Microstructures Inside a Silicon Wafer
Dry-Assisted Wet Etching
Silicon Molds for the Fabrication of PDMS Structures
Complex Patterns for Very-High-Aspect-Ratio Microstructures Using Photoelectrochemical
Etching
References
